TERA-print

ut it does not require a new stamp each time a new pattern is generated. Researchers can generate features across the nanometer, micrometer, and macroscopic length scales all with the same tool. Custom software allows one to generate any pattern of interest. Applications involve the generation of electronic circuitry, combinatorial libraries of hard and soft matter (e.g. DNA, proteins, carbohydrates, inorganic nano particles), and affinity templates that can localize nanoscopic structures at predefined locations on surfaces. TERA-print's Beam Pen Lithography(BPL) instrument also known as the E Series is the first commercial tool using this technology. This instrument uses arrays with as many as 20,000 independently addressable pens, each with a tiny aperture to pattern surfaces with light. The custom software allows the researcher to rapidly stitch fields together over a 0.5x0.4cm2 patterning area. Feature size resolution is sub-100 nanometers. This tool allows one to rapidly prototype electronic and optical devices, fabricate photomasks, and lithographically process photosensitive surfaces at the point-of-use. A clean room is not required.